Optical properties of a light-emitting polymer directly patterned by soft lithography

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Optical properties of a light-emitting polymer directly patterned by soft lithography

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Title: Optical properties of a light-emitting polymer directly patterned by soft lithography
Author: Lawrence, J. R.
Andrew, P.
Barnes, William L.
Buck, M.
Turnbull, G. A.
Samuel, I. D. W.
Citation: 81 (11), pp. 1955-1957
Publisher: American Institute of Physics
Journal: Applied Physics Letters
Date Issued: 2002
URI: http://hdl.handle.net/10036/37294
DOI: 10.1063/1.1502187
Links: http://dx.doi.org/10.1063/1.1502187 http://link.aip.org/link/?APPLAB/81/1955/1
Abstract: We present the optical properties of a directly patterned light-emitting polymer. The patterned poly(2-methoxy-5-(3',7'-dimethyloctyloxy)-paraphenylenevinylene film is fabricated using hot embossing lithography. The effect of the embossed microstructure on the light emitted from the polymer is examined by measuring the angle-dependent photoluminescence and its photonic band structure. The imposed grating modifies the emitted light by Bragg scattering into free space light that would otherwise be trapped as waveguide modes. This simple patterning technique may find application in improving the performance of light-emitting polymer devices.
Type: Article
Description: Copyright © 2002 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Applied Physics Letters 81 (2002) and may be found at http://link.aip.org/link/?APPLAB/81/1955/1
Keywords: organic semiconductorsphotoluminescencesurface treatmentsurface topographyphotonic band gapdiffraction gratingssemiconductor thin filmspolymer filmslithography
ISSN: 0003-6951


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