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dc.contributor.authorBointon, Thomas H.
dc.contributor.authorBarnes, Matthew D.
dc.contributor.authorRusso, Saverio
dc.contributor.authorCraciun, Monica F.
dc.date.accessioned2015-06-15T15:43:24Z
dc.date.issued2015-06-05
dc.description.abstractThe growth of graphene using resistive-heating cold-wall chemical vapor deposition (CVD) is demonstrated. This technique is 100 times faster and 99% lower cost than standard CVD. A study of Raman spectroscopy, atomic force microscopy, scanning electron micro­scopy, and electrical magneto-transport measurements shows that cold-wall CVD graphene is of comparable quality to natural graphene. Finally, the first transparent flexible graphene capacitive touch-sensor is demonstrated.en_GB
dc.description.sponsorshipEngineering and Physical Sciences Research Council (EPSRC)en_GB
dc.description.sponsorshipRoyal Societyen_GB
dc.identifier.citationVol. 27 (28), pp. 4200–4206
dc.identifier.doi10.1002/adma.201501600
dc.identifier.grantnumberEP/J000396/1en_GB
dc.identifier.grantnumberEP/K017160en_GB
dc.identifier.grantnumberEP/K010050/1en_GB
dc.identifier.grantnumberEP/G036101/1en_GB
dc.identifier.grantnumberEP/M002438/1en_GB
dc.identifier.grantnumberEP/M001024/1en_GB
dc.identifier.grantnumberTravel Exchange Grants 2012 and 2013en_GB
dc.identifier.urihttp://hdl.handle.net/10871/17553
dc.language.isoenen_GB
dc.publisherWiley-VCH Verlagen_GB
dc.relation.urlhttp://dx.doi.org/10.1002/adma.201501600en_GB
dc.rights© 2015 The Authors. Published by WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits use, distribution and reproduction in any medium, provided the original work is properly cited.en_GB
dc.subjectchemical vapor depositionen_GB
dc.subjectgrapheneen_GB
dc.subjectresistive heatingen_GB
dc.subjecttouch sensorsen_GB
dc.titleHigh Quality Monolayer Graphene Synthesized by Resistive Heating Cold Wall Chemical Vapor Depositionen_GB
dc.typeArticleen_GB
dc.date.available2015-06-15T15:43:24Z
dc.contributor.editorWilley
dc.identifier.issn0935-9648
pubs.declined2016-02-25T16:01:20.814+0000
pubs.deleted2016-02-25T16:01:21.114+0000
dc.identifier.eissn1521-4095
dc.identifier.journalAdvanced Materialsen_GB


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