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Tailoring diffraction characteristics of resonant, large area metagratings employing mask-free UV laser interference patterning

dc.contributor.authorRuiz de Galarreta, C
dc.contributor.authorSerna, R
dc.contributor.authorShields, J
dc.contributor.authorAlvarez-Alegria, M
dc.contributor.authorAriza, R
dc.contributor.authorManjavacas, A
dc.contributor.authorWright, CD
dc.contributor.authorSiegel, J
dc.date.accessioned2023-04-20T13:40:17Z
dc.date.issued2023-04-14
dc.date.updated2023-04-20T12:17:04Z
dc.identifier.citation2023 MRS Spring Meeting & Exhibit, San Francisco, California, 10 - 14 April 2023. Presentation EL16.14.04en_GB
dc.identifier.urihttp://hdl.handle.net/10871/132958
dc.identifierORCID: 0000-0003-4087-7467 (Wright, C David)
dc.language.isoenen_GB
dc.publisherMaterials Research Societyen_GB
dc.relation.urlhttps://www.mrs.org/meetings-events/spring-meetings-exhibits#past
dc.relation.urlhttps://www.mrs.org/meetings-events/spring-meetings-exhibits/past-spring-meetings/2023-mrs-spring-meeting/symposium-sessions/presentations
dc.rights© 2023 Materials Research Society
dc.titleTailoring diffraction characteristics of resonant, large area metagratings employing mask-free UV laser interference patterningen_GB
dc.typeConference paperen_GB
dc.date.available2023-04-20T13:40:17Z
exeter.locationSan Francisco
dc.descriptionThis is the author accepted manuscript. The final version is available from theen_GB
dc.rights.urihttp://www.rioxx.net/licenses/all-rights-reserveden_GB
rioxxterms.versionAMen_GB
rioxxterms.typeConference Paper/Proceeding/Abstracten_GB
refterms.dateFCD2023-04-20T13:35:47Z
refterms.versionFCDAM
refterms.dateFOA2023-07-28T12:49:31Z
refterms.panelBen_GB
pubs.name-of-conferenceMRS Spring Conference 2023


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