Electronic properties of graphene encapsulated with different two-dimensional atomic crystals.
American Chemical Society
This is the author accepted manuscript. The final version is available from the American Chemical Society via the DOI in this record.
Hexagonal boron nitride is the only substrate that has so far allowed graphene devices exhibiting micrometer-scale ballistic transport. Can other atomically flat crystals be used as substrates for making quality graphene heterostructures? Here we report on our search for alternative substrates. The devices fabricated by encapsulating graphene with molybdenum or tungsten disulfides and hBN are found to exhibit consistently high carrier mobilities of about 60 000 cm(2) V(-1) s(-1). In contrast, encapsulation with atomically flat layered oxides such as mica, bismuth strontium calcium copper oxide, and vanadium pentoxide results in exceptionally low quality of graphene devices with mobilities of ∼1000 cm(2) V(-1) s(-1). We attribute the difference mainly to self-cleansing that takes place at interfaces between graphene, hBN, and transition metal dichalcogenides. Surface contamination assembles into large pockets allowing the rest of the interface to become atomically clean. The cleansing process does not occur for graphene on atomically flat oxide substrates.
This work was supported by the European Research Council, Graphene Flagship, Engineering and Physical Sciences Research Council (UK), the Royal Society, US Office of Naval Research, US Air Force Office of Scientific Research, US Army Research Office.
Research Support, Non-U.S. Gov't
Research Support, U.S. Gov't, Non-P.H.S.
Vol. 14, No. 6, pp 3270–3276.
Place of publication