dc.contributor.author | Safaei, J | |
dc.contributor.author | Ullah, H | |
dc.contributor.author | Mohamed, NA | |
dc.contributor.author | Mohamad Noh, MF | |
dc.contributor.author | Soh, MF | |
dc.contributor.author | Tahir, AA | |
dc.contributor.author | Ahmad Ludin, N | |
dc.contributor.author | Ibrahim, MA | |
dc.contributor.author | Wan Isahak, WNR | |
dc.contributor.author | Mat Teridi, MA | |
dc.date.accessioned | 2018-06-04T09:32:43Z | |
dc.date.issued | 2018-04-23 | |
dc.description.abstract | BiVO 4 is a considerably promising semiconductor for photoelectrochemical water splitting due to its stability, low cost and moderate band gap. In this research, g-C 3 N 4 was proposed in Z-scheme configuration which boosted the performance of BiVO 4 up to four times. The experimental observations were counterchecked with Density Functional Theory (DFT) simulations. A TiO 2 /BiVO 4 heterojunction was developed and its performance was compared with that of g-C 3 N 4 /BiVO 4 . The photocurrent for g-C 3 N 4 /BiVO 4 was 0.42 mAcm −2 at 1.23 V vs. RHE which was the highest among g-C 3 N 4 based Z-scheme heterojunction devices. Lower charge transfer resistance, higher light absorption and more oxygen vacancy sites were observed for the g-C 3 N 4 based heterojunction. The simulated results attested that g-C 3 N 4 and BiVO 4 formed a van der Waals type heterojunction, where an internal electric field facilitated the separation of electron/hole pair at g-C 3 N 4 /BiVO 4 interface which further restrained the carrier recombination. Both the va lence and conduction band edge positions of g-C 3 N 4 and BiVO 4 changed with the Fermi energy level. The resulted heterojunction had small effective masses of electrons (0.01 m e ) and holes (0.10 m e ) with ideal band edge positions where both CBM and VBM were well above and below the redox potential of water. | en_GB |
dc.description.sponsorship | The authors would like to acknowledge financial support from Universiti Kebangsaan Malaysia through internal grant GUP-2016-089 and also for providing facilities to perform this research. H.U. acknowledges the supercomputing facilities of ESI Beowulf Cluster, University of Exeter, UK. | en_GB |
dc.identifier.citation | Vol. 234, pp. 296 - 310 | en_GB |
dc.identifier.doi | 10.1016/j.apcatb.2018.04.056 | |
dc.identifier.uri | http://hdl.handle.net/10871/33069 | |
dc.language.iso | en | en_GB |
dc.publisher | Elsevier | en_GB |
dc.rights.embargoreason | Under embargo until 23 April 2019 in compliance with publisher policy. | en_GB |
dc.rights | © 2018. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/ | en_GB |
dc.subject | Graphitic carbon nitride | en_GB |
dc.subject | Bismuth vanadate | en_GB |
dc.subject | Titanium dioxide | en_GB |
dc.subject | Z-Scheme | en_GB |
dc.title | Enhanced photoelectrochemical performance of Z-scheme g-C3N4/BiVO4 photocatalyst | en_GB |
dc.type | Article | en_GB |
dc.identifier.issn | 0926-3373 | |
dc.description | This is the author accepted manuscript. The final version is available from Elsevier via the DOI in this record. | en_GB |
dc.identifier.journal | Applied Catalysis B: Environmental | en_GB |