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dc.contributor.authorGester, M.en_GB
dc.contributor.authorDaboo, C.en_GB
dc.contributor.authorHicken, R.J.en_GB
dc.contributor.authorGray, S.J.en_GB
dc.contributor.authorErcole, A.en_GB
dc.contributor.authorBland, J.A.C.en_GB
dc.date.accessioned2013-01-18T11:39:46Zen_GB
dc.date.accessioned2013-03-20T13:13:06Z
dc.date.issued1996-07-01en_GB
dc.description.abstractWe have studied the evolution of the magnetic in‐plane anisotropy in epitaxial Fe/GaAs films of both (001) and (110) orientation as a function of the Fe layer thickness using the longitudinal magneto‐optic Kerr effect and Brillouin light scattering. Magnetization curves which are recorded in situ during film growth reveal a continuous change of the net anisotropy axes with increasing film thickness. This behavior can be understood to arise from the combination of a uniaxial and a cubic in‐plane magnetic anisotropy which are both thickness dependent. Structural analysis of the substrate and Fe film surfaces provides insight into the contribution of atomic steps at the interfaces to the magnetic anisotropy. Changing the degree of crystalline order at the Fe–GaAs interface allows us to conclude that the magnetic anisotropies are determined by atomic scale order.en_GB
dc.identifier.citationVol. 80 (1), pp. 347 - 355en_GB
dc.identifier.doi10.1063/1.362788en_GB
dc.identifier.urihttp://hdl.handle.net/10036/4177en_GB
dc.language.isoenen_GB
dc.publisherAmerican Institute of Physicsen_GB
dc.subjectironen_GB
dc.subjectthin filmsen_GB
dc.subjectmagnetic anisotropyen_GB
dc.subjectepitaxial layersen_GB
dc.subjectKerr effecten_GB
dc.subjectBrillouin effecten_GB
dc.subjectthicknessen_GB
dc.subjectcrystal structureen_GB
dc.subjectmagnetizationen_GB
dc.titleContinuous evolution of the in-plane magnetic anisotropies with thickness in epitaxial Fe filmsen_GB
dc.typeArticleen_GB
dc.date.available2013-01-18T11:39:46Zen_GB
dc.date.available2013-03-20T13:13:06Z
dc.identifier.issn0021-8979en_GB
dc.descriptionCopyright © 1996 American Institute of Physics.en_GB
dc.identifier.eissn1089-7550en_GB
dc.identifier.journalJournal of Applied Physicsen_GB


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