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dc.contributor.authorDurrant, CJ
dc.contributor.authorJokubaitis, M
dc.contributor.authorYu, W
dc.contributor.authorMohamad, H
dc.contributor.authorShelford, LR
dc.contributor.authorKeatley, PS
dc.contributor.authorXiao, G
dc.contributor.authorHicken, RJ
dc.date.accessioned2016-06-10T09:54:29Z
dc.date.issued2015-05-07
dc.description.abstractA selective area chemical vapour deposition technique has been used to fabricate continuous and patterned epitaxial CrO2 thin films on (100)-oriented TiO2 substrates. Precessional magnetization dynamics were stimulated both electrically and optically, and probed by means of time-resolved Kerr microscopy and vector network analyser ferromagnetic resonance techniques. The dependence of the precession frequency and the effective damping parameter upon the static applied magnetic field were investigated. All films exhibited a large in-plane uniaxial anisotropy. The effective damping parameter was found to exhibit strong field dependence in the vicinity of the hard axis saturation field. However, continuous and patterned films were found to possess generally similar dynamic properties, confirming the suitability of the deposition technique for fabrication of future spintronic devices.en_GB
dc.identifier.citationVol. 117 (17), article 17B707en_GB
dc.identifier.doi10.1063/1.4907766
dc.identifier.urihttp://hdl.handle.net/10871/21970
dc.language.isoenen_GB
dc.publisherAmerican Institute of Physics (AIP)en_GB
dc.subjectMagnetic anisotropyen_GB
dc.subjectChemical vapor depositionen_GB
dc.subjectEpitaxyen_GB
dc.subjectMagnetoopticen_GB
dc.subjectKerr effecten_GB
dc.subjectAnisotropyen_GB
dc.titleFerromagnetic resonance of patterned chromium dioxide thin films grown by selective area chemical vapour depositionen_GB
dc.typeArticleen_GB
dc.date.available2016-06-10T09:54:29Z
dc.identifier.issn0021-8979
dc.descriptionThis is the final version of the article. Available from the American Institute of Physics via the DOI in this record.en_GB
dc.identifier.journalJournal of Applied Physicsen_GB


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