dc.contributor.author | Durrant, CJ | |
dc.contributor.author | Jokubaitis, M | |
dc.contributor.author | Yu, W | |
dc.contributor.author | Mohamad, H | |
dc.contributor.author | Shelford, LR | |
dc.contributor.author | Keatley, PS | |
dc.contributor.author | Xiao, G | |
dc.contributor.author | Hicken, RJ | |
dc.date.accessioned | 2016-06-10T09:54:29Z | |
dc.date.issued | 2015-05-07 | |
dc.description.abstract | A selective area chemical vapour deposition technique has been used to fabricate continuous and patterned epitaxial CrO2 thin films on (100)-oriented TiO2 substrates. Precessional magnetization dynamics were stimulated both electrically and optically, and probed by means of time-resolved Kerr microscopy and vector network analyser ferromagnetic resonance techniques. The dependence of the precession frequency and the effective damping parameter upon the static applied magnetic field were investigated. All films exhibited a large in-plane uniaxial anisotropy. The effective damping parameter was found to exhibit strong field dependence in the vicinity of the hard axis saturation field. However, continuous and patterned films were found to possess generally similar dynamic properties, confirming the suitability of the deposition technique for fabrication of future spintronic devices. | en_GB |
dc.identifier.citation | Vol. 117 (17), article 17B707 | en_GB |
dc.identifier.doi | 10.1063/1.4907766 | |
dc.identifier.uri | http://hdl.handle.net/10871/21970 | |
dc.language.iso | en | en_GB |
dc.publisher | American Institute of Physics (AIP) | en_GB |
dc.subject | Magnetic anisotropy | en_GB |
dc.subject | Chemical vapor deposition | en_GB |
dc.subject | Epitaxy | en_GB |
dc.subject | Magnetooptic | en_GB |
dc.subject | Kerr effect | en_GB |
dc.subject | Anisotropy | en_GB |
dc.title | Ferromagnetic resonance of patterned chromium dioxide thin films grown by selective area chemical vapour deposition | en_GB |
dc.type | Article | en_GB |
dc.date.available | 2016-06-10T09:54:29Z | |
dc.identifier.issn | 0021-8979 | |
dc.description | This is the final version of the article. Available from the American Institute of Physics via the DOI in this record. | en_GB |
dc.identifier.journal | Journal of Applied Physics | en_GB |