A simple process for the fabrication of large-area CVD graphene based devices via selective in situ functionalization and patterning
Reason for embargo
We report a novel approach for the fabrication of micro- and nano-scale graphene devices via the in-situ plasma functionalization and in-situ lithographic patterning of large-area graphene directly on CVD catalytic metal (Cu) substrates. This enables us to create graphene-based devices in their entirety prior to any transfer processes, simplifying very significantly the device fabrication process and potentially opening up the route to the use of a wider range of target substrates. We demonstrate the capabilities of our technique via the fabrication of a flexible, transparent, graphene/graphene oxide humidity sensor that outperforms a conventional commercial sensor.
This work was carried out under the auspices of the EU FP7 project CareRAMM. This project received funding from the European Union Seventh Framework Programme (FP7/2007-2013) under grant agreement no 309980. The authors are grateful for helpful discussions with all CareRAMM partners, particularly Prof A. Ferrari and Ms A. Ott at the University of Cambridge, and Dr A. Sebastian and Dr W. Koelmans at IBM Research Zurich. We also gratefully acknowledge the assistance of the National EPSRC XPS User’s Service (NEXUS) at Newcastle University, UK (an EPSRC Mid-Range Facility) in carrying out the XPS measurements and the assistance of Prof S. Russo at the University of Exeter in carrying out humidity sensing measurements. A.M.A. would also like to thank Dr E. Alexeev for useful ideas for this Letter and pleasurable discussions of the results
This is the author accepted manuscript. The final version is available from the publisher via the DOI in this record.