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dc.contributor.authorNagareddy, VK
dc.contributor.authorOcton, TJ
dc.contributor.authorTownsend, NJ
dc.contributor.authorRusso, S
dc.contributor.authorCraciun, MF
dc.contributor.authorWright, CD
dc.date.accessioned2019-01-02T15:13:42Z
dc.date.issued2018-11-12
dc.description.abstractA highly effective laser thinning method is demonstrated to accurately control the thickness of MoTe2 layers. By utilizing the humidity present in the ambient atmosphere, multilayered MoTe2 films can be uniformly thinned all the way down to monolayer with layer-by-layer precision using an ultralow laser power density of 0.2 mW µm−2. Localized bandgap engineering is also performed in MoTe2, by creating regions with different bandgaps on the same film, enabling the formation of lateral homojunctions with sub-200 nm spatial resolution. Field-effect transistors fabricated from these thinned layers exhibit significantly improved electrical properties with an order of magnitude increase in on/off current ratios, along with enhancements in on-current and field-effect mobility values. Thinned devices also exhibit the fastest photoresponse (45 µs) for an MoTe2-based visible photodetector reported to date, along with a high photoresponsivity. A highly sensitive monolayer MoTe2 photodetector is also reported. These results demonstrate the efficiency of the presented thinning approach in producing high-quality MoTe2 films for electronic and optoelectronic applications.en_GB
dc.description.sponsorshipOffice of Naval Research Globalen_GB
dc.description.sponsorshipEngineering and Physical Sciences Research Council (EPSRC)en_GB
dc.description.sponsorshipDefence Science and Technology Laboratoryen_GB
dc.identifier.citationVol. 28 (52), article 1804434en_GB
dc.identifier.doi10.1002/adfm.201804434
dc.identifier.grantnumberN62909‐16‐1‐2174en_GB
dc.identifier.grantnumberEP/L015331/1en_GB
dc.identifier.urihttp://hdl.handle.net/10871/35297
dc.language.isoenen_GB
dc.publisherWileyen_GB
dc.rights© 2018 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.en_GB
dc.subjectbandgap engineeringen_GB
dc.subjectmolybdenum ditellurideen_GB
dc.subjectnanopatterningen_GB
dc.subjectoptoelectrical propertiesen_GB
dc.subjectphotochemical thinningen_GB
dc.titleHumidity‐Controlled Ultralow Power Layer‐by‐Layer Thinning, Nanopatterning and Bandgap Engineering of MoTe2en_GB
dc.typeArticleen_GB
dc.date.available2019-01-02T15:13:42Z
dc.identifier.issn1616-301X
dc.descriptionThis is the final version. Available on open access from Wiley via the DOI in this recorden_GB
dc.identifier.journalAdvanced Functional Materialsen_GB
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/en_GB
dcterms.dateAccepted2018-09-22
exeter.funder::European Commissionen_GB
exeter.funder::Engineering and Physical Sciences Research Council (EPSRC)en_GB
exeter.funder::Engineering and Physical Sciences Research Council (EPSRC)en_GB
rioxxterms.versionVoRen_GB
rioxxterms.licenseref.startdate2018-09-22
rioxxterms.typeJournal Article/Reviewen_GB
refterms.dateFCD2019-01-02T15:09:42Z
refterms.versionFCDVoR
refterms.dateFOA2019-01-02T15:13:46Z
refterms.panelBen_GB
refterms.depositExceptionpublishedGoldOA


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© 2018 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim

This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.
Except where otherwise noted, this item's licence is described as © 2018 The Authors. Published by WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited.