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dc.contributor.authorLadak, S.en_GB
dc.contributor.authorHicken, R.J.en_GB
dc.date.accessioned2013-01-24T15:21:16Zen_GB
dc.date.accessioned2013-03-20T13:14:42Z
dc.date.issued2005-12-01en_GB
dc.description.abstractHot electron transport has been studied in three terminal Ta/TaOx/Co/AlOx/Ni81Fe19 structures fabricated by magnetron sputtering through shadow masks. With the Co base and Ta collector connected together via a small resistor, the collector current contains contributions first from hot electrons injected from the Ni81Fe19 emitter, and second from a geometrical artifact that leads to tunneling from the Fermi level in the base. Both sources of collector current lead to a room temperature magnetocurrent effect. The hot electron contribution begins to dominate as the emitter-base voltage −Veb exceeds 0.3 V.en_GB
dc.identifier.citationVol. 87 (23), article 232504en_GB
dc.identifier.doi10.1063/1.2140480en_GB
dc.identifier.urihttp://hdl.handle.net/10036/4202en_GB
dc.subjecttantalumen_GB
dc.subjecttantalum compoundsen_GB
dc.subjectcobalten_GB
dc.subjectaluminium compoundsen_GB
dc.subjectnickel alloysen_GB
dc.subjectiron alloysen_GB
dc.subjecthot carriersen_GB
dc.subjectmagnetic tunnellingen_GB
dc.subjectsputteringen_GB
dc.subjectmasksen_GB
dc.subjectFermi levelen_GB
dc.titleEvidence for hot electron magnetocurrent in a double barrier tunnel junction deviceen_GB
dc.typeArticleen_GB
dc.date.available2013-01-24T15:21:16Zen_GB
dc.date.available2013-03-20T13:14:42Z
dc.identifier.issn0003-6951en_GB
dc.descriptionCopyright © 2005 American Institute of Physicsen_GB
dc.identifier.eissn1077-3118en_GB
dc.identifier.journalApplied Physics Lettersen_GB


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